Innovative patterning method for modifying few-layer MoS2 device geometries

Jiménez Urbanos F.Black A.Osorio M.R.Casado S.Granados, DanielBernardo-Gavito, Ramón2020-12-042020-12-042017http://hdl.handle.net/20.500.12614/1391enAtribución-NoComercial-SinDerivadas 3.0 Españahttp://creativecommons.org/licenses/by-nc-nd/3.0/es/Innovative patterning method for modifying few-layer MoS2 device geometriesconference paper10.1117/12.2272702