Publication:
Defect formation in a graphene overlayer on ruthenium under high pressure

Simple item page
dc.contributor.affiliation"Instituto Imdea Nanociencia, Calle Faraday 9, Madrid, 28049, Spain"," Departamento de Química, Universidad Autónoma de Madrid, Módulo 13, Madrid, 28049, Spain"," Condensed Matter Physics Center (IFIMAC),Cantoblanco, Madrid, 28049, Spain"," Institute for Advanced Research in Chemistry (IAdChem), Universidad Autónoma de Madrid, Madrid, 28049, Spain"en
dc.contributor.affiliation000000041762408X
dc.contributor.authorPisarra M.
dc.contributor.authorDíaz C.
dc.contributor.authorMartín, Fernando
dc.date.accessioned2020-12-04T11:41:07Z
dc.date.available2020-12-04T11:41:07Z
dc.date.issued2020
dc.identifier.doi10.1103/PhysRevB.102.075406en
dc.identifier.urihttp://hdl.handle.net/20.500.12614/759
dc.issue.number75406en
dc.journal.titlePhysical Review Ben
dc.language.isoenen
dc.relation.projectIDTEMPWe are grateful to Profs. J. Gómez-Herrero and J. M. Gómez-Rodríguez for suggesting the problem and for enlightening discussions. Work supported by the MINECO project FIS2016-77889-R, ‘Severo Ochoa’ Programme for Centers of Excellence in R&D (MINECO Grant SEV-2016-0686), and ‘María de Maeztu’ Programme for Units of Excellence in R&D (MINECO Grant MDM-2014-0377 and MICINN Grant CEX2018-000805-M). C.D. acknowledges the Ramón y Cajal program of the MINECO. We acknowledge the generous allocation of computer time by the Red Española de Supercomputación at the Magerit and Mare Nostrum computers centers and by the Centro de Computación Científica at the Universidad Autónoma de Madrid (CCC-UAM).
dc.rightsAtribución-NoComercial-SinDerivadas 3.0 España*
dc.rights.accessRightsopen accessen
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/3.0/es/*
dc.titleDefect formation in a graphene overlayer on ruthenium under high pressureen
dc.typeresearch articleen
dc.volume.number102en
dspace.entity.typePublication

Files

Collections

Publications