Publication:
Thickness-Dependent Reactivity of O2 on Cu Layers Grown on Ru(0001) Surfaces

dc.contributor.affiliation"Instituto de Física Rosario, CONICET, Universidad Nacional de Rosario, Bv. 27 de Febrero 210 bis, Rosario, 2000, Argentina"," Departamento de Química, Universidad Autónoma de Madrid, Madrid, 28049, Spain"," Condensed Matter Physics Center (IFIMAC), Universidad Autónoma de Madrid, Madrid, 28049, Spain"," Institute for Advanced Research in Chemical Sciences (IAdChem), Universidad Autónoma de Madrid, Madrid, 28049, Spain"," Instituo Madrileño de Estudios Avanzados en Nanociencia (IMDEA-nanociencia), Cantoblanco, Madrid, 28049, Spain"en
dc.contributor.affiliation000000041762408X
dc.contributor.authorRamos M.
dc.contributor.authorDíaz C.
dc.contributor.authorMartínez A.E.
dc.contributor.authorMartín, Fernando
dc.contributor.authorBusnengo H.F.
dc.date.accessioned2020-12-04T15:25:30Z
dc.date.available2020-12-04T15:25:30Z
dc.date.issued2018
dc.identifier.doi10.1021/acs.jpcc.8b04354
dc.identifier.urihttp://hdl.handle.net/20.500.12614/1511
dc.journal.titleJournal of Physical Chemistry C
dc.language.isoen
dc.page.initial15529
dc.relation.projectIDTEMPThe work was supported by CONICET project PIP 272, the UNR project PID ING534, the ANPCyT project PICT 2750, the MINECO Projects FIS2016-77889-R, the “Severo Ochoa” Programme for Centres of Excellence in R&D (SEV-2016-0686), the “Mariá de Maetzu” Programme for Units of Excellence in R&D (MDM-2014-0377), and the CAM project no. S2013/MIT-2850. C.D.i acknowledges the Ramón y Cajal program of the MINECO. We also acknowledge computer time provided by the CCT-Rosario Computational Center, member of the High Performance Computing National System (SNCAD, MinCyT-Argentina) and also from CCC-UAM.
dc.rightsAtribución-NoComercial-SinDerivadas 3.0 España*
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/3.0/es/*
dc.titleThickness-Dependent Reactivity of O2 on Cu Layers Grown on Ru(0001) Surfaces
dc.typeresearch article
dc.volume.number122
dspace.entity.typePublication
relation.isAuthorOfPublication23d66601-f50b-4d29-aa9c-5effea58cfdf
relation.isAuthorOfPublication.latestForDiscovery23d66601-f50b-4d29-aa9c-5effea58cfdf

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