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Epitaxial integration of CoFe 2 O 4 thin films on Si (001) surfaces using TiN buffer layers

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dc.contributor.affiliation"Dpto. Física Aplicada M-12, Universidad Autónoma de Madrid, Madrid, 28049, Spain"," Instituto de Química Física “Rocasolano”, CSIC, Madrid, 28006, Spain"," Centro de Microanálisis de Materiales (CMAM) and Dpto. Física de la Materia Condensada, Universidad Autónoma de Madrid, Madrid, 28049, Spain"," Dpto. de Física de Materiales andUnidad Asociada IQFR-CSIC, Universidad Complutense de Madrid, Madrid, E-28040, Spain"," IMDEA Nanoscience, Madrid, 28049, Spain"," Instituto de Ciencia de Materiales de Madrid, CSIC, Madrid, E-28049, Spain"en
dc.contributor.affiliation000000041762408X
dc.contributor.authorPrieto P.
dc.contributor.authorMarco J.F.
dc.contributor.authorPrieto J.E.
dc.contributor.authorRuiz-Gómez S.
dc.contributor.authorPérez, Lucas
dc.contributor.authordel Real R.P.
dc.contributor.authorVázquez M.
dc.contributor.authorde la Figuera J.
dc.date.accessioned2020-12-04T15:25:33Z
dc.date.available2020-12-04T15:25:33Z
dc.date.issued2018
dc.identifier.doi10.1016/j.apsusc.2017.12.111
dc.identifier.urihttp://hdl.handle.net/20.500.12614/1575
dc.journal.titleApplied Surface Science
dc.language.isoen
dc.page.initial1067
dc.relation.projectIDTEMPThis work was supported in part by the Regional Government of Madrid under Project NANOFRONTMAGS2013/MIT-2850.
dc.rightsAtribución-NoComercial-SinDerivadas 3.0 España*
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/3.0/es/*
dc.titleEpitaxial integration of CoFe 2 O 4 thin films on Si (001) surfaces using TiN buffer layers
dc.typeresearch article
dc.volume.number436
dspace.entity.typePublication
relation.isAuthorOfPublication45a77c54-5130-4868-9194-d2b4859a44f8
relation.isAuthorOfPublication.latestForDiscovery45a77c54-5130-4868-9194-d2b4859a44f8

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